OAK RIDGE, Tenn., Feb. 11, 2020 — Thomas Kurfess, chief manufacturing officer and senior distinguished scientist for manufacturing at the Department of Energy’s Oak Ridge National Laboratory, has been elected a member of the National Academy of Engineers for his contributions to innovative digital manufacturing technologies and system architectures.
Andover, Mass., – February 11, 2020 – MKS Instruments, Inc. (NASDAQ: MKSI), a global provider of technologies that enable advanced processes and improve productivity, today announced the release of its next generation Series 49UL Thermal Management System for Semiconductor, Analytic and Advanced markets.
Uzwil (Switzerland), February 11, 2020 – At the end of January 2020, Bühler’s information security management system has been certified with the most respected cyber security standard: ISO 27001:2013. With this certification, Bühler showcases how important information security is for the company. ISO 27001 protects key areas such as internal business IT, the automation solution Mercury MES, the Bühler Insights platform, and the myBühler customer portal. “Today, over 85 % of our solutions can be connected to Bühler Insights. We want to show our customers that their data is as secure with us as it is currently possible. Digital services from Bühler conform to the highest possible security standards,” says Stuart Bashford, Digital Officer at Bühler Group.
OAK RIDGE, Tenn., Feb. 3, 2020 — An international team of researchers has discovered the hydrogen atoms in a metal hydride material are much more tightly spaced than had been predicted for decades — a feature that could possibly facilitate superconductivity at or near room temperature and pressure. Such a superconducting material, carrying electricity without any energy loss due to resistance, would revolutionize energy efficiency in a broad range of consumer and industrial applications.
Since 2000 Vacuum Technology & Coating Magazine has been the industry's leading source for the latest articles, news, and product and service information. Below we describe some of the terms that you will find in a typical issue of VT&C.
Vacuum Coating (Vacuum Deposition and Thin Film Deposition) is the process of depositing a film or other material atom by atom or molecule by molecule onto a surface in a low pressure environment or vacuum.
Physical Vapor Deposition or PVD refers to vacuum deposition methods which involve the material (which is being deposited) going from a condensed phase to a vapor phase and then to a thin film condensed phase. Sputtering and evaporation are common PVD processes.
Sputtering refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from a target source.
Evaporation refers to the heated source material being evaporated in a vacuum. Vacuum allows vapor particles to travel directly to the target object, where they condense back to a solid state. (called a Deposition Source) refers to a type of process used to deposit thin films and employs a plasma to bombard and eject atoms from the target source (called a Deposition Source).
Vacuum Hardware refers to the types of hardware and components that are used in the vacuum process. There are many types of hardware used in this process, some examples are flanges, fittings, seals, valves, and chambers.
Thin Film Metrology involves determining the optimal thickness, composition and/or condition of a coating through various techniques and mathematical calculations.
Gas Analytical Systems are used in the analysis of residual gases within a low pressure environment or vacuum.
Vacuum Pumps are devices that remove gas atoms and molecules for the purpose of leaving behind a partial vacuum. Some examples of types of vacuum pumps are rotary vane pumps, diaphragm pumps, and scroll pumps.
Every issue of VT&C includes a product showcase focused on a specific topic relevant to Vacuum Processing, please see our editorial calendar which lists the topic for each issue.